ELIAS
World’s leading commercial echelle spectrometer series in Littrow configuration with highest spectral resolution – for highly resolving spectral characterization of emission and absorption lines in particular for excimer laser lithography.
- Intensity dynamics of up to 4 orders
- Highest spectral resolution (2.5 million-10 million)
- Very high imaging quality
- Simple and error-free operation
- Motorized optomechanics
Setup
The ELIAS spectrometers are extremely thermally and mechanically stable. All models are equipped with fully motorized optomechanics for the automatic focusing and positioning of the spectrum on the detector. By applying reflection optics with broadband UV layers, chromatic aberrations are avoided. The light coupling into the spectrometer is realized via SMA fiber or reflection transfer optics.
The supplied operating software Sophi with optional LabVIEW library for complete remote control of the ELIAS allows fully access of all spectrometer-detector functions via graphic user interface. A scan mode provides the sequential measurements of a larger wavelength range, larger than the free spectral range at a time.
Models
The optical design of all ELIAS models is identical with the standard version ELIAS I.
ELIAS I: Standard version of the ELIAS series.
ELIAS II: ELIAS model with much higher spectral resolving capability, fast shutter and high-resolution detector system with improved cooling for advanced time-resolved measurement with significantly higher signal-to-noise ratio.
ELIAS III: Enhanced development of the ELIAS II with integrated retroreflector that allows to use the echelle grating four times. This doubles the spectral resolution of the ELIAS II.
ELIAS LD: Low Dispersion ELIAS model that does not resolve the halfwidths of the lines with 5 to 10 pixels but instead the free spectral range could be trebled without considerably decreasing the spectral resolving capability compared to ELIAS I.
WAVEMETER: ELIAS I model for absolute wavelength determination at 193 nm
ELIAS VUV: A vacuum-suited ELIAS I model for the analysis of F2 lasers with a wavelength of 157 nm.
Model | ELIAS I ELIAS VUV |
ELIAS II | ELIAS III | ELIAS-LD | WAVEMETER | ||
---|---|---|---|---|---|---|---|
Pass | single | double | double | quadruple | single | double | |
Wavelength [nm] | λsimul [pm] | λsimul [pm] | λsimul [pm] | λsimul [pm] | λsimul [pm] | λsimul [pm] | λsimul [pm] |
157 | 45 | 14 | – | – | 152 | 49 | |
193 | 48 | 15 | 16.4 | 8.4 | 170 | 52 | 50 |
248 | 64 | 20 | 22.5 | 11.5 | 227 | 71 | |
266 | 73 | 25 | 29.7 | 15 | 275 | 92 | |
532 | 146 | 49 | 59.4 | 29.9 | 551 | 185 | |
766 | 244 | 82 | 92.5 | 47.5 | 846 | 293 | |
1,064 | 292 | 98 | 200 | 101 | – | 626 | |
Wavelength [nm] | FWHM [pm] | FWHM [pm] | FWHM [pm] | FWHM [pm] | FWHM [pm] | FWHM [pm] | FWHM [pm] |
157 | 0.254 | 0.083 | – | – | 0.31 | 0.10 | |
193 | 0.283 | 0.086 | 0.060 | 0.030 | 0.34 | 0.11 | 0.34 |
248 | 0.376 | 0.117 | 0.082 | 0.041 | 0.46 | 0.15 | |
266 | 0.428 | 0.147 | 0.112 | 0.056 | 0.55 | 0.19 | |
532 | 0.856 | 0.294 | 0.225 | 0.112 | 1.10 | 0.37 | |
766 | 1.400 | 0.482 | 0.339 | 0.170 | 1.70 | 0.59 | |
1,064 | 1.711 | 0.588 | 0.450 | 0.225 | – | 1.25 |
Subject to technical changes without notice
Specifications
Optical design | echelle monochromator in Littrow configuration |
Aperture | f/50 |
Absolute accuracy | better than ±5 pm when calibrating with internal Hg lamp |
Detector | CCD – ELIAS I: 1,024 pixels; ELIAS II/III: 2,048 pixels |
Exposure time, min. | ELIAS I: 18 ms; ELIAS II/III: 2 ms |
Signal-to-noise ratio (SNR) | at level 40,000; better 10,000 / 40 dB |
Rel. pixel dispersion error | 0.2 fm for 193 nm double pass (depends on wavelength) |
Dynamic range | 16 bit AD conversion, effectively approx. 33,000:1 |
Light coupling | fiber, except for ELIAS VUV (mirror optics) |
Wavelength calibration | with integrated mercury lamp (253.652 nm) |
Computer | PC incl. TFT with Microsoft Windows |
Software | Sophi, LabVIEW library optional |
Dimensions without detector (L x W x H) | (1,400 x 310 x 250) mm ELIAS I |
Weight without detector | 50 kg |
Features | integrated mechanical shutter |
Subject to technical changes without notice
Spectra
Applications
- Excimer laser lithography
- Measuring of the spectral temporal stability of diode lasers, solid state lasers and emission lines of lamps
- Precise absolute wavelength determination of emission lines
- LIBS – laser-induced breakdown spectroscopy